Skip to main content

Search Proceedings

IMPACT OF STOCHASTIC LINE EDGE ROUGHNESS PATTERNS ON SCATTEROMETRY

Hermann Gross, Sebastian Heidenreich, Markus Bär
  • Abstract:
    We present a fast non-rigorous method for the analysis of stochastic line edge roughness (LER) with amplitudes in the range of a few nanometers, based on a 2D Fourier transform method. LER has an significant impact on the light diffraction patterns measured by scatterometry. Scatterometry is a fast, non-destructive optical method used in wafer metrology to determine the geometry parameters of periodic surface structures from scattered light intensities.
  • Keywords:
    scatterometry, critical dimensions (CDs), line edge roughness (LER), Fourier optics
  • Download:
  • DOI:
    _unreg_wc-2015.393

Event details:

  • IMEKO TC:
  • Event name:
    XXI IMEKO World Congress
  • Title:

    Measurement in Research and Industry

  • Place:
    Prague, CZECH REPUBLIC
  • Time:
    30 August 2015 - 04 September 2015