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DENSITY MEASUREMENT OF A THIN-FILM BY THE PRESSURE-OF-FLOTATION METHOD

Atsushi Waseda, Kenichi Fujii
  • Abstract:
    A method for density and thickness measurements of a thin-film is described by the pressure-offlotation method (PFM). The density and thickness of a silicon thermal oxide layer on silicon crystal are determined by measuring the density and mass differences for the sample with and without the thin-film. Details on the density and thickness measurement and the results of the measurements are presented.
  • Keywords:
    density, pressure-of-flotation, thin-film, molybdenum, silicon oxide
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  • DOI:
    _unreg_wc-2006.TC3-039

Event details:

  • IMEKO TC:
  • Event name:
    XVIII IMEKO World Congress
  • Title:

    Metrology for a Sustainable Development

  • Place:
    Rio de Janeiro, BRAZIL
  • Time:
    17 September 2006 - 22 September 2006